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Description
| - The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations.
- The paper presents a detailed analysis of structure-hardness relations in hard and superhard nanostructured Ti(Al,V)Nx films with a low content of Al(5 at.%)and V(2 at.%). The Ti(Al,V)Nx films were prepared by d.c. reactive magnetron sputtering. Special attention is devoted to the energy Epi delivered to the growing film by bombarding ions. It was found that Ti(Al,V)Nx films form a superhard material with hardness H>40 GPa; superhard Ti(Al,V)Nx films are: poly-oriented films characterized with at least two broad, low-intensity X-ray reflections, i.e. are composed of small grains of different crystallographic orientations. (en)
- Článek představuje detailní analýzu závislosti tvrdosti na struktuře naprašovaných tvrdých a supertvrdých nanostrukturních Ti(Al,V)Nx vrstev. Důležitým faktorem nutným pro tvorbu supertvrdých vrstev byla energie dodaná vrstvě dopadajícími ionty Epi. Vytvořené vrstvy měly tvrdost H  40 GPa, nízké tlakové pnutí  ≤ -2 GPa a byly vytvořeny při celkovém tlaku pT = 0.5 Pa a energii Epi  0.5 MJ/cm3. Bylo ukázáno, že supertvrdý nanostrukturní materiál může být tvořen zrny jednoho materiálu s různou krystalografickou orientací. (cs)
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Title
| - Structure-hardness relations in sputtered Ti-Al-V-N films
- Structure-hardness relations in sputtered Ti-Al-V-N films (en)
- Závislost tvrdosti na struktuře naprašovaných Ti-Al-V-N vrstev (cs)
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skos:prefLabel
| - Structure-hardness relations in sputtered Ti-Al-V-N films
- Structure-hardness relations in sputtered Ti-Al-V-N films (en)
- Závislost tvrdosti na struktuře naprašovaných Ti-Al-V-N vrstev (cs)
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skos:notation
| - RIV/49777513:23520/03:00000090!RIV07-MSM-23520___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(ME 529), Z(MSM 235200002)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/03:00000090
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Ti-Al-V-N nanostructured films; structure; hardness; chemical composition; mechanical properties; magnetron sputtering (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Musil, Jindřich
- Vlček, Jaroslav
- Poláková, Helena
- Mitterer, Christian
- Alaart, Jan
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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