Attributes | Values |
---|
rdf:type
| |
Description
| - Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them.
- Pulsed dc magnetron sputtering gives us new possibilities in deposition processes, because it allows to form films under new physical conditions, e.g. at high deposition rates, at highly ionized fluxes of sputtered particles and at a possible simultaneo usputtering and evaporation of a target. The aim of this work is to investigate the relative densities of argon (working gas) atoms and ions, and copper (target) atoms and ions in front of a sputtered target during voltage pulses and in pauses between them. (en)
|
Title
| - Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
- Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy (en)
|
skos:prefLabel
| - Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy
- Characterization of pulsed dc magnetron sputtering plasmas using time-resolved optical emission spectroscopy (en)
|
skos:notation
| - RIV/49777513:23520/03:00000042!RIV/2004/MSM/235204/N
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/03:00000042
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - pulsed magnetron sputtering;optical emission spectroscopy (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...v/mistoKonaniAkce
| |
http://linked.open...i/riv/mistoVydani
| |
http://linked.open...i/riv/nazevZdroje
| - Proceedings of the XIVth Symposium on Application of Plasma Processes
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...ocetUcastnikuAkce
| |
http://linked.open...nichUcastnikuAkce
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...iv/tvurceVysledku
| - Musil, Jindřich
- Pajdarová, Andrea Dag
- Vlček, Jaroslav
- Bělský, Petr
- Leština, Jan
|
http://linked.open...vavai/riv/typAkce
| |
http://linked.open.../riv/zahajeniAkce
| |
http://linked.open...n/vavai/riv/zamer
| |
number of pages
| |
http://purl.org/ne...btex#hasPublisher
| |
https://schema.org/isbn
| |
http://localhost/t...ganizacniJednotka
| |