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  • V této práci byly zkoumány povrchové vlastnosti tenkých vrstev SnO2 připravených plazmovou oxidací tenkých vrstev cínu za dodatečného ohřevu substrátu. Vlastnosti vrstev oxidů byly zkoumány mikroskopií atomárních sil (AFM) a hmotnostní spektrometrií sekundárních iontů (SIMS). Dosažené výsledky ukázaly, že plazmová oxidace tenkých vrstev cínu za dodatečného ohřevu substrátu je jednou z možných alternativních metod přípravy stechiometrických SnO2 vrstev. (cs)
  • In this paper were studied surface properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation with additional substrate heating. The oxide layer properties were investigated by Atomic Force Microscopy (AFM) and Secondary Ion Mass Spectrometry (SIMS). The plasma oxidation with additional substrate heating is a possible alternative method for preparing stochiometric SnO2 layers.
  • In this paper were studied surface properties of SnO2 thin films produced by thermal evaporation of Sn films followed by in situ plasma oxidation with additional substrate heating. The oxide layer properties were investigated by Atomic Force Microscopy (AFM) and Secondary Ion Mass Spectrometry (SIMS). The plasma oxidation with additional substrate heating is a possible alternative method for preparing stochiometric SnO2 layers. (en)
Title
  • Surface characterization of plasma oxidized tin films
  • Surface characterization of plasma oxidized tin films (en)
  • Analýza povrchu plazmaticky oxidovaných tenkých vrstev cínu. (cs)
skos:prefLabel
  • Surface characterization of plasma oxidized tin films
  • Surface characterization of plasma oxidized tin films (en)
  • Analýza povrchu plazmaticky oxidovaných tenkých vrstev cínu. (cs)
skos:notation
  • RIV/44555601:13440/05:00003099!RIV06-MSM-13440___
http://linked.open...avai/riv/aktivita
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  • P(OC 527.50)
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  • 545471
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  • RIV/44555601:13440/05:00003099
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  • plasma oxidation; SnO2 thin films; AFM; SIMS. (en)
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  • [F942D123961C]
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  • Toronto, Kanada
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  • CD
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  • Centre for Advanced Coating Technologies, Faculty of Applied
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  • Pavlík, Jaroslav
  • Strýhal, Zdeněk
  • Hedbávný, P.
  • Vágner, Tomáš
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  • 13440
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