Chemical vapor deposition reactor with hot wall was developed in order for the epitaxial TiO2 film to grow. Heterogenous deposition reactions of organic precursors on carbon steel substrate were performed by pyrolysis under different conditions.
Chemical vapor deposition reactor with hot wall was developed in order for the epitaxial TiO2 film to grow. Heterogenous deposition reactions of organic precursors on carbon steel substrate were performed by pyrolysis under different conditions. (en)