About: The Calculation of the V-shape Microstrip Line Impedance by the Conformal Mapping Method     Goto   Sponge   Distinct   Permalink

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  • The boundary element method (BEM) is used for the strip centered coaxial line (SCCL). The common microstrip line has one disadvantage - a lot of electromagnetic field is spread outside the dielectric substrate. This field moves sqrt(er) times faster than field under the microstrip inside the dielectric substrate. This deformation of the field (HEM wave) complicates the application of the microstrip line on frequencies over c. 20 GHz. Described complication can be eliminated in the structure, which cumulates major portmon of power density of the EM field in dielectric substrate to the detriment of free space above the strip.
  • The boundary element method (BEM) is used for the strip centered coaxial line (SCCL). The common microstrip line has one disadvantage - a lot of electromagnetic field is spread outside the dielectric substrate. This field moves sqrt(er) times faster than field under the microstrip inside the dielectric substrate. This deformation of the field (HEM wave) complicates the application of the microstrip line on frequencies over c. 20 GHz. Described complication can be eliminated in the structure, which cumulates major portmon of power density of the EM field in dielectric substrate to the detriment of free space above the strip. (en)
Title
  • The Calculation of the V-shape Microstrip Line Impedance by the Conformal Mapping Method
  • The Calculation of the V-shape Microstrip Line Impedance by the Conformal Mapping Method (en)
skos:prefLabel
  • The Calculation of the V-shape Microstrip Line Impedance by the Conformal Mapping Method
  • The Calculation of the V-shape Microstrip Line Impedance by the Conformal Mapping Method (en)
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  • RIV/00216305:26220/07:PU68554!RIV10-MSM-26220___
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  • Z(MSM0021630513), Z(MSM0021630516)
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  • 412522
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  • RIV/00216305:26220/07:PU68554
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  • microstrip line, coaxial mictrostrip line, boundary element method, confomal mappinf method (en)
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  • US - Spojené státy americké
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  • Progress In Electromagnetics
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  • 1
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  • Fiala, Pavel
  • Hadinec, Michal
  • Šádek, Václav
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  • 1559-9450
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  • 26220
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