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Description
  • The project is aimed at plasma technologies with a high application potential. Research will be mainly focused on fundamental aspects of magnetron operation in three novel high-power pulsed systems. They will be used for high-rate deposition of carbon-based films, various oxide and nitride films and for deposition of high-temperature Si-B-C-N films. (en)
  • Cílem projektu je objasnění fyzikální podstaty činnosti tří nových magnetronových systémů pro rychlou depozici vrstev a pulzní magnetronové depozice vrstev na bázi uhlíku a nových vrstev Si-B-C-N s mimořádně vysokou teplotní stabilitou.
Title
  • Novel plasma sources for film deposition and surface modification (en)
  • Nové plazmové zdroje pro depozici vrstev a modifikaci povrchů
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  • OC10045
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  • Novel plasma sources; film deposition and surface modification; magnetron sputtering; high-power pulsed systems; carbon-based films; oxides and nitrides; high-temperature Si-B-C-N materials. (en)
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  • Nestacionární model byl použit k objasnění procesu vysokovýkonové pulzní magnetronové depozice. Dva pulzní magnetronové systémy byly využity k přípravě nevodivých oxidů a oxynitridů Ta-O-N, vysokoteplotních materiálů Si-B-C-N a nanostrukturních vrstev Zr-B-C-N. Výsledky byly publikovány v 5 článcích v mezinárodních časopisech a prezentovány ve 12 příspěvcích na mezinárodních konferencích. (cs)
  • Non-stationary model was used for explanation of high-power impulse magnetron sputtering. Two pulsed magnetron systems were used to prepare non-conductive oxides and Ta-O-N oxynitrides, high-temperature Si-B-C-N materials and nanostructured Zr-B-C-N films. The results were published in 5 papers in international journals and presented in 12 contributions at international conferences. (en)
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  • magnetron sputtering
  • carbon-based films
  • film deposition and surface modification
  • high-power pulsed systems
  • oxides and nitrides
  • Novel plasma sources
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